Medium abrasive cutting pad for removal of medium defects and scratches e.g. in combination with Koch Chemie Fine Cut F6.01.
The low height of 23mm creates lower torsional forces, very good handling and highest stability. The special density of the foam material allows a long lasting compression hardness during polishing. The optimized reticulation (open-cell) and cell count contribute to high abrasiveness. The milled edge provides more flexibility of the pad to better conform to contours.
Velcro color-matched to the polish ensuring process reliability.
Crush hardness: 12. Abrasiveness: 5.
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